PubList


 * Publications **

1. “Synthesis and Characterization of Poly(4-//t//-Butoxycarbonyloxystyrene-sulfone)” R.S. Kanga, J.M. Kometani, E. Reichmanis, J.E. Hanson, O. Nalamasu, L.F. Thompson, S.A. Heffner, W.W. Tai, P. Trevor, //Chemistry of Materials//, **1991**, //3//, 660-667.

2. “Single Component Chemically Amplified Resist Materials for Electron-beam and X-ray Lithography” A.E. Novembre, W.W. Tai, J.M. Kometani, J.E. Hanson, O. Nalamasu, G.N. Taylor, E. Reichmanis, and L.F. Thompson, //SPIE: Advances in Resist Technology and Processing VIII//, **1991**, //1466//, 89-99

3. “PTBSS: A High Resolution Single Component Aqueous Base Soluble Chemically Amplified Resist” A.E. Novembre, W.W. Tai, J.M. Kometani, J.E. Hanson, O. Nalamasu, G.N. Taylor, E. Reichmanis, L.F. Thompson //Journal of Vacuum Science and Technology B// **1991**, //9//, 3338-3342.

4. “Radiation-Induced Chemistry of Poly(4-[(//tert//-butoxycarbonyl)oxy]styrene-(//co//-sulfur dioxide))” A.E. Novembre, W.W. Tai, J.M. Kometani, J.E. Hanson, O. Nalamasu, G.N. Taylor, E. Reichmanis, L.F. Thompson //Chemistry of Materials//, **1992**, //4//, 278-284.

5. “Lithographic Properties of Single- and Multi-component Chemically Amplified Resists Based on Copolymers of 4-//t//-Butoxycarbonyloxystyrene (TBS) and Sulfur Dioxide (SO 2 )” A.E. Novembre, J.E. Hanson, J.M. Kometani, W.W. Tai, O. Nalamasu, G.N. Taylor, E. Reichmanis, L.F. Thompson, D. Tomes //Microcircuit Engineering// **1992**, //17//, 257-262.

6. “Synthesis and Evaluation of Copolymers of 4-//t//-Butoxycarbonyloxystyrene and 2-Nitro-benzylstyrene Sulfonates: Single Component Chemically Amplified Deep UV Imaging Materials” J.E. Hanson, E. Reichmanis, F.M. Houlihan, T.X. Neenan //Chemistry of Materials//, **1992**, //4//, 837-842.

7. “Arylmethyl Sulfones: A New Class of Photoacid Generators” A.E. Novembre, J.E. Hanson, J.M. Kometani, W.W. Tai, E. Reichmanis, L.F. Thompson, R.J. West //Polymer Engineering and Science//, **1992**, //32//, 1476-1480.

8. “Effect of Post-Exposure Delay in Positive Acting Chemically Amplified Resists: An Analytical Study” O. Nalamasu, E. Reichmanis, J.E. Hanson, R.S. Kanga, L.A. Heimbrook, A.B. Emerson, F.A. Baiocci, and S. Vaidya. //Polymer Engineering and Science//, **1992**, //32//, 1565-1570.

9. “X-ray and Deep UV Radiation Response of t-BOC Protected 4-Hydroxystyrene-Sulfone Copolymers” A.E. Novembre, J.E. Hanson, J.M. Kometani, W.W. Tai, E. Reichmanis in “Irradiation of Polymeric Materials” ACS Symposium Series #527, Reichmanis, O'Donnell, and Frank, editors, Washington DC, 1992.

10. “Sensitivity Enhancement of t-BOC Based Chemically Amplified Resists Through Optimization of Process Prebake Conditions” A.E. Novembre, J.M. Kometani, W.W. Tai, E. Reichmanis, L.F. Thompson, J.E. Hanson // Journal of Photopolymer Science and Technology // **1992**, //5//, 9-15.

11. “t-BOC Based Resists: A Polymeric Platform for 0.25 m m Lithographic Technologies” O. Nalamasu, A.E. Novembre, J.M. Kometani, J.E. Hanson //Journal of Photopolymer Science and Technology// **1993**, //6//, 457-472.

12. “The 1.4 and 248 nm Radiation Response of Chemically Amplified Resists Containing Arylmethyl Sulfone Photoacid Generators” J.E. Hanson, D.A. Pingor, A.E. Novembre, J.M. Kometani, W.W. Tai //Polymers for Advanced Technology// **1994**, //5//, 49-55.

13. “Weak Temperature Dependence of Electron Transfer Rates in Fixed-Distance Porphyrin -Quinone Model Systems” L.R. Khundkar, J.W. Perry, J.E. Hanson, P.B. Dervan. //Journal of the American Chemical Society// **1994**, //116//, 9700-9709.

14. “Photoacid and Photobase Generators: Arylmethyl Sulfones and Ammonium Salts” J.E. Hanson, K.H. Jensen, N. Gargiulo, D. Motta, D.A. Pingor, A.E. Novembre, D.A. Mixon, J.M. Kometani, C. Knurek //Polymeric Materials: Science and Engineering//, **1995**, //72//, 201-202.

15. “Photoacid and Photobase Generators: Arylmethyl Sulfones and Benzhydrylammonium Salts” J.E. Hanson, K.H. Jensen, N. Gargiulo, D. Motta, D.A. Pingor, A.E. Novembre, D.A. Mixon, J.M. Kometani, C. Knurek in ACS Symposium Series No. 614, //Microelectronics Technology: Polymers for Advanced Imaging and Packaging//, E. Reichmanis, C.K. Ober, S.A. MacDonald, T. Iwayanagi, and T. Nishikubo eds. American Chemical Society: Washington DC, 1995, 137-148.

16. “New Approaches to the Synthesis of Poly(aryl ether) Dendrimers” T.L. Tyler, J.E. Hanson //Polymeric Materials: Science and Engineering//, **1995**, //73//, 356-357.

17. “Chromophore Labelled Dendrimers: Photophysical Probes of Dendrimer Structure and Dynamics” J.E. Hanson, W.R. Murphy Jr., J.M. Riley, T.L. Tyler, S.O. Kelley, A.M. Makarewicz, //Polymeric Materials: Science and Engineering//, **1995**, //73//, 358-359.

18. “Imaging and Materials Processing with Photogenerated Bases” J.E. Hanson, K.H. Jensen //Imaging Science and Technology//, **1996**, //49//, 508-511.

19. “Photophysical Studies of Pyrene Focused Poly(aryl ether) Monodendrons: Quenching and Excimer Formation” J.E. Hanson, W.A. Khan, W. R. Murphy, Jr. //Polymeric Materials: Science and Engineering//, **1999**, //80//, 68-69.

20. “An Efficient Synthesis of Poly(aryl ether) Monodendrons and Dendrimers Based on 3,5-Bis(Hydroxymethyl)phenol” T.L. Tyler, J.E .Hanson //Chemistry of Materials//, **1999**, //11//, 3452-2459.

21. “Dendrimers as Stationary Phases in Capillary Electrochromatography” H.Chao, J.E. Hanson. //Polymeric Materials Science and Engineering//, **2000**, //83//, 438-439.

22. “Carbamates as Novel Dissolution Inhibitors in Photoresists” T. Watt, J.E. Hanson, WR. Murphy,Jr. //Partners in Science:// //Chemical Communication//, **2000**, 48-50.

23. “Pyrene Labeled Poly(aryl ether) Monodendrons: Synthesis, Characterization, Diffusion Coefficients, and Photophysical Studies” J.M. Riley, S. Alkan, A. Chen, M. Shapiro, W.A. Khan, W.R. Murphy, Jr., J.E. Hanson //Macromolecules//, **2001**, //34//, 1797-1809.

24. “Using NPS Chromatography to Monitor Mesylation Reactions” C.J. Shaw, H. Chao, J.E. Hanson //J. Liq. Chrom.& Rel. Technol.// **2001**, //24//,869-880.

25. “Synthesis and Photochemistry of Tertiary Amine Photobase Generators” K.H. Jensen, J.E. Hanson //Chemistry of Materials//, **2002**, //14//, 918-923.

26. “Dendritic Polymers as Bonded Stationary Phases in Capillary Electrochromatography” H.C.Chao, J.E. Hanson //Journal of Separation Science//, **2002**, //25//, 345-350.

27. “Synthesis and Characterization of Novel Unsymmetrical Hyperbranched Poly(phenylene sulfides)” Mellace, A.; Hanson, J.E. //Polymer Preprints//, **2003**, //44(2)//, 845-846. 28. “Synthesis of Cyclopropane Dendrimers” Han, H.J.; Hanson, J.E. //Polymer Preprints//, **2003**, //44(2)//, 798-799. 29. “Polymerization of 4-Chloro-1,3-Benzenedithiol” Miklius, E.; Griepenburg, J.; Hanson, J.E. //Polymer Preprints// **2003**, //44(2)//, 797. 30. “Cross-linking of Polyethyleneimine with Isophthalaldehyde: A Model for Soluble Imprinted Polymers” Li, S.; Hanson, J.E. //Polymeric Materials Science and Engineering// **2003**, //89//, 559. 31. “Hyperbranched Poly(phenylene sulfide) and Poly(phenylene sulfone)” Mellace, A.; Hanson, J.E.; Griepenburg, J. //Chemistry of Materials// **2005**, //17//, 1812-1817. 32. “Direct Synthesis of Poly(arylmethylsulfone) Monodendrons” Zhao, Q.; Hanson, J.E.; //Synthesis// **2006**, 397-399. 33. “Fluorescence Excitation Spectroscopy of Polystyrene Near the Critical Concentration c*” Healy, M.S.; Hanson, J.E.; //Journal of Applied Polymer Science// **2007**, //104//, 360-364. 34. Book Review: **// Polymers and Light: Fundamentals and Technical Applications //**** By Wolfram Schnabel (Hahn-Meitner-Institut, Berlin, Germany). Wiley-VCH Verlag GmbH & Co. KGaA: Weinheim. 2007. ** Hanson, J.E.; //Journal of the American Chemical Society// **2007**, //129//, 14526-14527.

1. U.S. Patent 5,374,504 "Resist Materials and Processes of Their Use" J.E.Hanson and A.E.Novembre (issued December 20, 1994)
 * Patents **