Publications

1. “Synthesis and Characterization of Poly(4-t-Butoxycarbonyloxystyrene-sulfone)”
R.S. Kanga, J.M. Kometani, E. Reichmanis, J.E. Hanson, O. Nalamasu, L.F. Thompson, S.A. Heffner, W.W. Tai, P. Trevor, Chemistry of Materials, 1991, 3, 660-667.

2. “Single Component Chemically Amplified Resist Materials for Electron-beam and X-ray Lithography”
A.E. Novembre, W.W. Tai, J.M. Kometani, J.E. Hanson, O. Nalamasu, G.N. Taylor, E. Reichmanis, and L.F. Thompson, SPIE: Advances in Resist Technology and Processing VIII, 1991, 1466, 89-99

3. “PTBSS: A High Resolution Single Component Aqueous Base Soluble Chemically Amplified Resist”
A.E. Novembre, W.W. Tai, J.M. Kometani, J.E. Hanson, O. Nalamasu, G.N. Taylor, E. Reichmanis, L.F. Thompson Journal of Vacuum Science and Technology B 1991, 9, 3338-3342.

4. “Radiation-Induced Chemistry of Poly(4-[(tert-butoxycarbonyl)oxy]styrene-(co-sulfur dioxide))”
A.E. Novembre, W.W. Tai, J.M. Kometani, J.E. Hanson, O. Nalamasu, G.N. Taylor, E. Reichmanis, L.F. Thompson Chemistry of Materials , 1992, 4, 278-284.

5. “Lithographic Properties of Single- and Multi-component Chemically Amplified Resists Based on Copolymers of 4-t-Butoxycarbonyloxystyrene (TBS) and Sulfur Dioxide (SO
2)”
A.E. Novembre, J.E. Hanson, J.M. Kometani, W.W. Tai, O. Nalamasu, G.N. Taylor, E. Reichmanis, L.F. Thompson, D. Tomes Microcircuit Engineering 1992, 17, 257-262.

6. “Synthesis and Evaluation of Copolymers of 4-t-Butoxycarbonyloxystyrene and 2-Nitro-benzylstyrene Sulfonates: Single Component Chemically Amplified Deep UV Imaging Materials”
J.E. Hanson, E. Reichmanis, F.M. Houlihan, T.X. Neenan Chemistry of Materials , 1992, 4, 837-842.

7. “Arylmethyl Sulfones: A New Class of Photoacid Generators”
A.E. Novembre, J.E. Hanson, J.M. Kometani, W.W. Tai, E. Reichmanis, L.F. Thompson, R.J. West Polymer Engineering and Science , 1992, 32, 1476-1480.

8. “Effect of Post-Exposure Delay in Positive Acting Chemically Amplified Resists: An Analytical Study”
O. Nalamasu, E. Reichmanis, J.E. Hanson, R.S. Kanga, L.A. Heimbrook, A.B. Emerson, F.A. Baiocci, and S. Vaidya. Polymer Engineering and Science , 1992, 32, 1565-1570.

9. “X-ray and Deep UV Radiation Response of t-BOC Protected 4-Hydroxystyrene-Sulfone Copolymers”
A.E. Novembre, J.E. Hanson, J.M. Kometani, W.W. Tai, E. Reichmanis in “Irradiation of Polymeric Materials” ACS Symposium Series #527, Reichmanis, O'Donnell, and Frank, editors, Washington DC, 1992.

10. “Sensitivity Enhancement of t-BOC Based Chemically Amplified Resists Through Optimization of Process Prebake Conditions”
A.E. Novembre, J.M. Kometani, W.W. Tai, E. Reichmanis, L.F. Thompson, J.E. Hanson

Journal of Photopolymer Science and Technology 1992, 5, 9-15.

11. “t-BOC Based Resists: A Polymeric Platform for 0.25
mm Lithographic Technologies”
O. Nalamasu, A.E. Novembre, J.M. Kometani, J.E. Hanson Journal of Photopolymer Science and Technology 1993, 6, 457-472.

12. “The 1.4 and 248 nm Radiation Response of Chemically Amplified Resists Containing Arylmethyl Sulfone Photoacid Generators”
J.E. Hanson, D.A. Pingor, A.E. Novembre, J.M. Kometani, W.W. Tai Polymers for Advanced Technology 1994, 5, 49-55.

13. “Weak Temperature Dependence of Electron Transfer Rates in Fixed-Distance Porphyrin -Quinone Model Systems”
L.R. Khundkar, J.W. Perry, J.E. Hanson, P.B. Dervan. Journal of the American Chemical Society 1994, 116, 9700-9709.

14. “Photoacid and Photobase Generators: Arylmethyl Sulfones and Ammonium Salts”
J.E. Hanson, K.H. Jensen, N. Gargiulo, D. Motta, D.A. Pingor, A.E. Novembre, D.A. Mixon, J.M. Kometani, C. Knurek Polymeric Materials: Science and Engineering, 1995, 72, 201-202.

15. “Photoacid and Photobase Generators: Arylmethyl Sulfones and Benzhydrylammonium Salts”
J.E. Hanson, K.H. Jensen, N. Gargiulo, D. Motta, D.A. Pingor, A.E. Novembre, D.A. Mixon, J.M. Kometani, C. Knurek in ACS Symposium Series No. 614, Microelectronics Technology: Polymers for Advanced Imaging and Packaging, E. Reichmanis, C.K. Ober, S.A. MacDonald, T. Iwayanagi, and T. Nishikubo eds. American Chemical Society: Washington DC, 1995, 137-148.

16. “New Approaches to the Synthesis of Poly(aryl ether) Dendrimers”
T.L. Tyler, J.E. Hanson Polymeric Materials: Science and Engineering, 1995, 73, 356-357.

17. “Chromophore Labelled Dendrimers: Photophysical Probes of Dendrimer Structure and Dynamics”
J.E. Hanson, W.R. Murphy Jr., J.M. Riley, T.L. Tyler, S.O. Kelley, A.M. Makarewicz, Polymeric Materials: Science and Engineering, 1995, 73, 358-359.

18. “Imaging and Materials Processing with Photogenerated Bases”
J.E. Hanson, K.H. Jensen Imaging Science and Technology, 1996, 49, 508-511.

19. “Photophysical Studies of Pyrene Focused Poly(aryl ether) Monodendrons: Quenching and Excimer Formation”
J.E. Hanson, W.A. Khan, W. R. Murphy, Jr. Polymeric Materials: Science and Engineering, 1999, 80, 68-69.

20. “An Efficient Synthesis of Poly(aryl ether) Monodendrons and Dendrimers Based on 3,5-Bis(Hydroxymethyl)phenol”
T.L. Tyler, J.E .Hanson Chemistry of Materials, 1999, 11, 3452-2459.

21. “Dendrimers as Stationary Phases in Capillary Electrochromatography”
H.Chao, J.E. Hanson. Polymeric Materials Science and Engineering, 2000, 83, 438-439.

22. “Carbamates as Novel Dissolution Inhibitors in Photoresists”
T. Watt, J.E. Hanson, WR. Murphy,Jr. Partners in Science: Chemical Communication, 2000, 48-50.

23. “Pyrene Labeled Poly(aryl ether) Monodendrons: Synthesis, Characterization, Diffusion Coefficients, and Photophysical Studies”
J.M. Riley, S. Alkan, A. Chen, M. Shapiro, W.A. Khan, W.R. Murphy, Jr., J.E. Hanson Macromolecules, 2001, 34, 1797-1809.

24. “Using NPS Chromatography to Monitor Mesylation Reactions”
C.J. Shaw, H. Chao, J.E. Hanson J. Liq. Chrom.& Rel. Technol. 2001, 24,869-880.

25. “Synthesis and Photochemistry of Tertiary Amine Photobase Generators”
K.H. Jensen, J.E. Hanson Chemistry of Materials, 2002, 14, 918-923.

26. “Dendritic Polymers as Bonded Stationary Phases in Capillary Electrochromatography”
H.C.Chao, J.E. Hanson Journal of Separation Science, 2002, 25, 345-350.

27. “Synthesis and Characterization of Novel Unsymmetrical Hyperbranched Poly(phenylene sulfides)”

Mellace, A.; Hanson, J.E. Polymer Preprints, 2003, 44(2), 845-846.

28. “Synthesis of Cyclopropane Dendrimers”

Han, H.J.; Hanson, J.E. Polymer Preprints, 2003, 44(2), 798-799.

29. “Polymerization of 4-Chloro-1,3-Benzenedithiol”

Miklius, E.; Griepenburg, J.; Hanson, J.E. Polymer Preprints 2003, 44(2), 797.

30. “Cross-linking of Polyethyleneimine with Isophthalaldehyde: A Model for Soluble Imprinted Polymers”

Li, S.; Hanson, J.E. Polymeric Materials Science and Engineering 2003, 89, 559.

31. “Hyperbranched Poly(phenylene sulfide) and Poly(phenylene sulfone)”

Mellace, A.; Hanson, J.E.; Griepenburg, J. Chemistry of Materials 2005, 17, 1812-1817.

32. “Direct Synthesis of Poly(arylmethylsulfone) Monodendrons”

Zhao, Q.; Hanson, J.E.; Synthesis 2006, 397-399.

33. “Fluorescence Excitation Spectroscopy of Polystyrene Near the Critical Concentration c*”

Healy, M.S.; Hanson, J.E.; Journal of Applied Polymer Science 2007, 104, 360-364.

34. Book Review: Polymers and Light: Fundamentals and Technical Applications By Wolfram Schnabel (Hahn-Meitner-Institut, Berlin, Germany). Wiley-VCH Verlag GmbH & Co. KGaA: Weinheim. 2007.

Hanson, J.E.; Journal of the American Chemical Society 2007, 129, 14526-14527.

Patents

1. U.S. Patent 5,374,504 "Resist Materials and Processes of Their Use"
J.E.Hanson and A.E.Novembre (issued December 20, 1994)